two zone rtp tube furnace with cvd mos2 thin film preparation sliding | cyky

Two zone Rtp tube furnace is a process used in the manufacture of semiconductor devices that includes heating a plurality of semiconductor wafers to affect their electrical properties. Heat treatment is designed for different effects. The wafer can be heated to activate the dopant, convert the film into a thin film or convert the film into a wafer substrate interface, make a densely deposited film, change the state of the grown film, repair the implanted damage, move the dopant or dope The agent is transferred from one film to another or from the film into the wafer substrate.

Two zone Rtp tube furnace can be integrated into other furnace processing steps, such as oxidation, or it can be disposed of by itself. The annealing furnace is completed by equipment designed to heat semiconductor wafers. The annealing furnace is an energy-saving periodic working furnace with ultra-energy-saving structure and fiber structure, saving 60% of electricity.

Two zone Rtp tube furnace Application

1.Rapid Thermal Annealing,ion implantation annealing

2.Graphene CVD preparation, nanotube growthing

3.Rapid thermal oxidation,Rapid thermal Nitriding

4.Silicidation,diffusion,contact alloying,crystallization and densification

from China Suppliers, you can buy quality RTP furnace from Zhengzhou CY Scientific Instrument Co., Ltd